CHARACTERIZATION OF TIO2/SIO2 MULTILAYERS BY HIGH-RESOLUTION TRANSMISSION ELECTRON-MICROSCOPY AND ELECTRON-ENERGY-LOSS SPECTROSCOPY

被引:30
作者
YUZHANG, K
BOISJOLLY, G
RIVORY, J
KILIAN, L
COLLIEX, C
机构
[1] ESSILOR INC CORP,F-94100 ST MAUF,FRANCE
[2] UNIV PARIS 06,OPT SOLIDES LAB,CNRS,URA 781,F-75252 PARIS 05,FRANCE
[3] UNIV REIMS,MICROSCOPIE ELECTR LAB,F-51100 REIMS,FRANCE
[4] UNIV PARIS 11,PHYS SOLIDE LAB,CNRS,URA 002,F-91405 ORSAY,FRANCE
关键词
ELECTRON ENERGY LOSS SPECTROSCOPY; ELECTRON MICROSCOPY; SILICON OXIDE; TITANIUM OXIDE;
D O I
10.1016/0040-6090(94)90337-9
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Titanium dioxide and silicon dioxide multilayer stacks with typical thicknesses of a few nanometres have been evaporated by two electron beam guns. The high resolution transmission electron microscopy (HRTEM) and electron energy loss spectroscopy (EELS) techniques were used to characterize the microstructure and chemical composition of these multilayer stacks. The HRTEM images show that the SiO2 layers are amorphous as expected, while the TiO2 layers present traces of crystallinity even for small thicknesses. The EELS analysis of the recorded Si L(23), O K and Ti L(23) edges reveals that the O K edge in TiO2 exhibits a prepeak due to the presence of unoccupied O 2p-Ti 3d hybridized states, which constitutes another clear identification of the TiO2 layers.
引用
收藏
页码:299 / 302
页数:4
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