VALIDITY OF FOWLER-NORDHEIM PARAMETERS MEASURED FOR SILICON ADSORPTION ON SINGLE-CRYSTAL FACES OF TUNGSTEN

被引：15

作者：

COLLINS, RA ^{[1
]}

机构：

[1] UNIV LANCASTER,DEPT PHYS,PHYS ELECTR,LANCASTER LA1 4YB,ENGLAND

来源：

SURFACE SCIENCE | 1973年 / 40卷 / 03期

关键词：

D O I：

10.1016/0039-6028(73)90138-6

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

引用

收藏

页码：470 / 478

页数：9

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