ION-BEAM SPUTTERING DEPOSITION OF TUNGSTEN - ENERGY AND MASS EFFECTS OF PRIMARY IONS

被引：19

作者：

MEYER, F

BOUCHIER, D

STAMBOULI, V

PELLET, C

SCHWEBEL, C

GAUTHERIN, G

机构：

来源：

APPLIED SURFACE SCIENCE | 1989年 / 38卷 / 1-4期

关键词：

D O I：

10.1016/0169-4332(89)90549-7

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

引用

页码：286 / 294

页数：9

共 23 条

[1]

Andersen H.H, 1981, SPUTTERING PARTICLE

[2] SEMI-QUANTITATIVE INSITU AUGER ANALYSIS OF SILICON-NITRIDE LAYERS DEPOSITED BY REACTIVE ION-BEAM SPUTTERING [J].

BOSSEBOEUF, A ;

BOUCHIER, D .

SURFACE SCIENCE, 1985, 162 (1-3) :695-701

[3]

Bottiger J., 1971, Radiation Effects, V11, P61, DOI 10.1080/00337577108230450

[4] THE INTERACTION OF LOW-ENERGY ION-BEAMS WITH SURFACES [J].

CARTER, G ;

ARMOUR, DG .

THIN SOLID FILMS, 1981, 80 (1-3) :13-30

[5] FACE-CENTERED-CUBIC TUNGSTEN FILMS OBTAINED BY [J].

CHOPRA, KL ;

RANDLETT, MR ;

DUFF, RH .

APPLIED PHYSICS LETTERS, 1966, 9 (11) :402-&

[6] REFLECTION OF HEAVY-IONS [J].

ECKSTEIN, W ;

BIERSACK, JP .

ZEITSCHRIFT FUR PHYSIK B-CONDENSED MATTER, 1986, 63 (04) :471-478

[7]

ELBAUM LK, 1986, J VAC SCI TECHNOL A, V4, P3106

[8] The conductivity of thin metallic films according to the electron theory of metals [J].

Fuchs, K .

PROCEEDINGS OF THE CAMBRIDGE PHILOSOPHICAL SOCIETY, 1938, 34 :100-108

[9]

GAUTHERIN G, 1985, THIN FILMS FREE ATOM, pCH5

[10] PLASMA-SURFACE AND GAS-SURFACE INTERACTIONS DURING THE CHEMICAL VAPOR-DEPOSITION OF TUNGSTEN FROM H2/WF6 [J].

GREEN, WM ;

HESS, DW ;

OLDHAM, WG .

JOURNAL OF APPLIED PHYSICS, 1988, 64 (09) :4696-4703

← 1 2 3 →