NBN EDGE JUNCTION FABRICATION - EDGE PROFILE CONTROL BY REACTIVE ION ETCHING

被引：4

作者：

MENG, XF

AMOS, RS

LICHTENBERGER, AW

MATTAUCH, RJ

FELDMAN, MJ

机构：

来源：

IEEE TRANSACTIONS ON MAGNETICS | 1989年 / 25卷 / 02期

关键词：

D O I：

10.1109/20.92520

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

页码：1239 / 1242

页数：4

共 18 条

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