SIO2/SI INTERFACE STUDY WITH SYNCHROTRON RADIATION X-RAY-DIFFRACTION

被引:10
作者
HIROSAWA, I
AKIMOTO, K
TATSUMI, T
MIZUKI, J
MATSUI, J
机构
[1] NEC CORP LTD,MICROELECTR RES LABS,MIYAMAE KU,KAWASAKI,KANAGAWA 213,JAPAN
[2] NEC CORP LTD,RES & DEV GRP,TSUKUBA,IBARAKI 305,JAPAN
关键词
D O I
10.1016/0022-0248(90)90183-L
中图分类号
O7 [晶体学];
学科分类号
0702 ; 070205 ; 0703 ; 080501 ;
摘要
SiO2/Si(111)-7 × 7 and SiO2/Si(100)-2 × 1 interface superstructures were observed with a grazing incidence X-ray diffraction method. Interface superstructures were observed only in the samples of which SiO2 layers were deposited by a molecular beam deposition method; they were not observed in thermally oxidized samples. Intensities of fractional-order diffraction in the SiO2/Si(100)-2 × 1 system suggest that the observed superstructure is composed of dimer reconstruction like a clean surface or ordering structure of deposited silicon and oxygen atoms, but not of a crystalline SiO2, such as cristobalite or tridymite. © 1990.
引用
收藏
页码:150 / 155
页数:6
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