ION SPUTTERING YIELD MEASUREMENTS FOR SUBMICROMETER THIN-FILMS

被引：32

作者：

VEISFELD, N ^{[1
]}

GELLER, JD ^{[1
]}

机构：

[1] GELLER MICROANALYT LAB,PEABODY,MA 01960

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1988年 / 6卷 / 03期

关键词：

D O I：

10.1116/1.575188

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

引用

页码：2077 / 2081

页数：5

共 15 条

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[2] CARTER G, 1968, ION BOMBARDMENT SOLI, P323
[3] CZANDERNA AW, 1975, METHODS SURFACE ANAL, P14
[4] FINE J, 1980, PHYSICS IONIZED GASE
[5] GELLER JD, 1984, APPL SURF SCI, V18, P18, DOI 10.1016/0378-5963(84)90036-9
[6] HOFMANN S, 1980, SURF INTERFACE ANAL, V2, P4
[7] HOLLOWAY PH, 1981, SURF INTERFACE ANAL, V3, P3
[8] SPUTTERING YIELDS OF METALS FOR AR+ AND NE+ IONS WITH ENERGIES FROM 50 TO 600 EV
LAEGREID, N
WEHNER, GK
[J]. JOURNAL OF APPLIED PHYSICS, 1961, 32 (03) : 365 - &
[9] SPUTTERING YIELDS FOR LOW ENERGY HE+-, KR+-, AND XE+-ION BOMBARDMENT
ROSENBERG, D
WEHNER, GK
[J]. JOURNAL OF APPLIED PHYSICS, 1962, 33 (05) : 1842 - &
[10] SNOUSE TW, 1962, 8TH T NAT VAC S, V1, P271