THE EFFECT OF ION-IMPLANTATION ON RF-SPUTTERED TIB2 FILMS

被引：19

作者：

PADMANABHAN, KR

SORENSEN, G

机构：

来源：

THIN SOLID FILMS | 1981年 / 81卷 / 01期

关键词：

D O I：

10.1016/0040-6090(81)90498-3

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：13 / 19

页数：7

共 12 条

[1] ACTIVATED REACTIVE EVAPORATION PROCESS FOR HIGH RATE DEPOSITION OF COMPOUNDS [J].

BUNSHAH, RF ;

RAGHURAM, AC .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1972, 9 (06) :1385-&

[2] FABRICATION AND CHARACTERIZATION OF VAPOR-DEPOSITED NIOBIUM AND ZIRCONIUM CARBIDES [J].

CAPUTO, AJ .

THIN SOLID FILMS, 1977, 40 (JAN) :49-55

[3] EFFECT OF ION BOMBARDMENT ON ADHESION OF ALUMINIUM FILMS ON GLASS [J].

COLLINS, LE ;

PERKINS, JG ;

STROUD, PT .

THIN SOLID FILMS, 1969, 4 (01) :41-&

[4] ION-BOMBARDMENT OF GROUP-IV ELEMENTAL METAL AND SYNTHETIC NITRIDE FILMS [J].

DUCKWORTH, RG ;

WILSON, IH .

THIN SOLID FILMS, 1979, 63 (02) :289-297

[5]

FELDMAN LC, 1977, ION BEAM HDB MATERIA, P118

[6]

HARTLEY NEW, 1980, TREATISE MATERIALS S, V18, P321

[7]

KAMINSKY M, 1979, THIN SOLID FILMS, V63, P269

[8] SURFACE HARDENING OF BERYLLIUM BY ION-IMPLANTATION [J].

KANT, RA ;

HIRVONEN, JK ;

KNUDSON, AR ;

WOLLAM, JS .

THIN SOLID FILMS, 1979, 63 (01) :27-30

[9] THIN-FILM FORMATION OF IN2O3, TIN, AND TAN BY RF REACTIVE ION PLATING [J].

MURAYAMA, Y .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1975, 12 (04) :818-820

[10] PREPARATION AND COMPOSITIONAL ANALYSIS OF SPUTTERED TAN FILMS [J].

REICHELT, K ;

NELLEN, W ;

MAIR, G .

JOURNAL OF APPLIED PHYSICS, 1978, 49 (10) :5284-5287

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