EFFECTS OF VARIOUS ATMOSPHERES ON THE REDUCED-PRESSURE CVD OF AL2O3 THIN-FILMS AT LOW-TEMPERATURES

被引：33

作者：

SARAIE, J

ONO, K

TAKEUCHI, S

机构：

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1989年 / 136卷 / 10期

关键词：

D O I：

10.1149/1.2096415

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

收藏

页码：3139 / 3141

页数：3

相关论文

共 4 条

[1] DEPOSITION AND PROPERTIES OF ALUMINUM OXIDE OBTAINED BY PYROLYTIC DECOMPOSITION OF AN ALUMINUM ALKOXIDE [J].

ABOAF, JA .

JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1967, 114 (09) :948-&

[2] OPTICAL AND ELECTRICAL CHARACTERIZATIONS OF LASER CHEMICAL-VAPOR-DEPOSITED ALUMINUM OXYNITRIDE FILMS [J].

DEMIRYONT, H ;

THOMPSON, LR ;

COLLINS, GJ .

JOURNAL OF APPLIED PHYSICS, 1986, 59 (09) :3235-3240

[3]

Duffy M. T., 1970, RCA Review, V31, P754

[4] CHEMICAL VAPOR-DEPOSITION OF AL2O3 THIN-FILMS UNDER REDUCED PRESSURES [J].

SARAIE, J ;

KOWN, J ;

YODOGAWA, Y .

JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1985, 132 (04) :890-892