INFLUENCE OF INELASTIC-SCATTERING ON THE PHOTOEMISSION LINE-SHAPE FOR SMALL PARTICLES

被引:2
作者
DAVIS, SM
机构
[1] Exxon Research Development Laboratories, Baton Rouge, Louisiana 70821
关键词
D O I
10.1021/la00092a039
中图分类号
O6 [化学];
学科分类号
0703 ;
摘要
A simple approach for estimating dispersed-phase particle size from XPS results is proposed by considering the influence of inelastic scattering on the photoemission line shape. This analysis predicts a high sensitivity for detecting particle size differences for sizes in the range of about 0.5λ < d < 3λ, where X is the photoelectron attenuation length (e.g., sizes in the range of about 10-60 A). Opportunities exist for applying this type of analysis in studies of model heterogeneous catalysts. © 1990, American Chemical Society. All rights reserved.
引用
收藏
页码:517 / 519
页数:3
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