THE DEPOSITION RATE AND PROPERTIES OF THE DEPOSIT IN PLASMA ENHANCED CHEMICAL VAPOR-DEPOSITION OF TIN

被引：24

作者：

JANG, DH ^{[1
]}

CHUN, JS ^{[1
]}

KIM, JG ^{[1
]}

机构：

[1] DAEWOO HEAVY IND CO LTD,CTR TECH,INCHEON 134,SOUTH KOREA

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1989年 / 7卷 / 01期

关键词：

D O I：

10.1116/1.575763

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

引用

页码：31 / 35

页数：5

共 16 条

[1] THE PLASMA-ASSISTED CHEMICAL VAPOR-DEPOSITION OF TIC, TIN AND TICXN1-X [J].

ARCHER, NJ .

THIN SOLID FILMS, 1981, 80 (1-3) :221-225

[2]

BONIFIELD TD, 1982, DEPOSITION TECHNOLOG, P365

[3]

BRANDOLF H, 1982, CUTTING TOOL ENG, V34, P4

[4] TIN COATINGS ON STEEL [J].

BUHL, R ;

PULKER, HK ;

MOLL, E .

THIN SOLID FILMS, 1981, 80 (1-3) :265-270

[5] A CORRELATION OF AUGER-ELECTRON SPECTROSCOPY, X-RAY PHOTOELECTRON-SPECTROSCOPY, AND RUTHERFORD BACKSCATTERING SPECTROMETRY MEASUREMENTS ON SPUTTER-DEPOSITED TITANIUM NITRIDE THIN-FILMS [J].

BURROW, BJ ;

MORGAN, AE ;

ELLWANGER, RC .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1986, 4 (06) :2463-2469

[6] QUANTITATIVE AUGER-ELECTRON ANALYSIS OF TITANIUM NITRIDES [J].

DAWSON, PT ;

TZATZOV, KK .

SURFACE SCIENCE, 1985, 149 (01) :105-118

[7] ADHESION OF TITANIUM NITRIDE COATINGS ON HIGH-SPEED STEELS [J].

HELMERSSON, U ;

JOHANSSON, BO ;

SUNDGREN, JE ;

HENTZELL, HTG ;

BILLGREN, P .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1985, 3 (02) :308-315

[8] COMPOSITION, MORPHOLOGY AND MECHANICAL-PROPERTIES OF PLASMA-ASSISTED CHEMICALLY VAPOR-DEPOSITED TIN FILMS ON M2-TOOL STEEL [J].

HILTON, MR ;

NARASIMHAN, LR ;

NAKAMURA, S ;

SALMERON, M ;

SOMORJAI, GA .

THIN SOLID FILMS, 1986, 139 (03) :247-260

[9]

HOLLAHAN JR, 1978, THIN FILM PROCESSES, P335

[10]

KIKUCHI N, 1984, 9TH P INT C CHEM VAP, P728

← 1 2 →