X-RAY FOCUSING WITH ELLIPTIC KIRKPATRICK-BAEZ MIRROR SYSTEM

被引：15

作者：

SUZUKI, Y ^{[1
]}

UCHIDA, F ^{[1
]}

机构：

[1] HITACHI LTD, CENT RES LAB, KOKUBUNJI, TOKYO 185, JAPAN

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS | 1991年 / 30卷 / 05期

关键词：

X-RAY MICROPROBE; SYNCHROTRON RADIATION; X-RAY MIRROR; X-RAY MICROSCOPY; KIRKPATRICK-BAEZ MICROSCOPE;

D O I：

10.1143/JJAP.30.1127

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

Focusing Properties of a grazing-incidence mirror system are tested using a monochromatized synchrotron radiation X-ray source. The optical system employs two mirrors, each of elliptical cylinder shape, arranged in a crossed-mirror geometry (Kirkpatrick-Baez configuration) and generates a demagnified image of a 100-mu-m-diameter pinhole placed upstream in the beamline as the X-ray source. Edge-scan profiles show the focused spot size at half-maximum of about 1.7-mu-m x 3.8-mu-m at a wavelength of 2.3 angstrom. In two-dimensional scanning of test patterns, a fine pattern of a 0.6-mu-m line and 0.6-mu-m space was resolved.

引用

页码：1127 / 1130

页数：4

共 13 条

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