CRITICAL-BEHAVIOR OF THE HALL-COEFFICIENT OF SIP AT THE METAL-INSULATOR-TRANSITION

被引:20
作者
DAI, PH
ZHANG, YZ
SARACHIK, MP
机构
[1] Physics Department, City College, City University of New York, New York
来源
PHYSICAL REVIEW B | 1994年 / 49卷 / 19期
关键词
D O I
10.1103/PhysRevB.49.14039
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Measurements down to 0.06 K indicate that the Hall coefficient of Si:P diverges as the metal-insulator transition is approached, in contrast with an earlier report by Koon and Castner for Si:As, and in disagreement with their claim for Si:P. We show that zero-temperature extrapolations deduced from data above 0.5 K, the range used in the earlier experiments, can yield a Hall coefficient that appears to remain finite.
引用
收藏
页码:14039 / 14042
页数:4
相关论文
共 36 条
[21]   STRUCTURE AND ELECTRONIC PSEUDOGAPS OF STABLE QUASI-CRYSTALS (VOL 47, PG 2522, 1993) [J].
PHILLIPS, JC .
PHYSICAL REVIEW B, 1993, 48 (01) :665-665
[22]   INDICATION OF UNIVERSAL BEHAVIOR OF HALL CONDUCTIVITY NEAR THE METAL-INSULATOR-TRANSITION IN DISORDERED-SYSTEMS [J].
ROHDE, M ;
MICKLITZ, H .
PHYSICAL REVIEW B, 1987, 36 (14) :7572-7575
[23]   METAL-INSULATOR-TRANSITION IN A DOPED SEMICONDUCTOR [J].
ROSENBAUM, TF ;
MILLIGAN, RF ;
PAALANEN, MA ;
THOMAS, GA ;
BHATT, RN ;
LIN, W .
PHYSICAL REVIEW B, 1983, 27 (12) :7509-7523
[24]   REVERSE-FIELD RECIPROCITY FOR CONDUCTING SPECIMENS IN MAGNETIC-FIELDS [J].
SAMPLE, HH ;
BRUNO, WJ ;
SAMPLE, SB ;
SICHEL, EK .
JOURNAL OF APPLIED PHYSICS, 1987, 61 (03) :1079-1084
[25]   SCALING THEORY OF THE HALL-EFFECT IN DISORDERED ELECTRONIC SYSTEMS [J].
SHAPIRO, B ;
ABRAHAMS, E .
PHYSICAL REVIEW B, 1981, 24 (07) :4025-4030
[26]   POSSIBLE SOLUTION OF THE CONDUCTIVITY EXPONENT PUZZLE FOR THE METAL-INSULATOR-TRANSITION IN HEAVILY-DOPED UNCOMPENSATED SEMICONDUCTORS [J].
STUPP, H ;
HORNUNG, M ;
LAKNER, M ;
MADEL, O ;
VONLOHNEYSEN, H .
PHYSICAL REVIEW LETTERS, 1993, 71 (16) :2634-2637
[27]  
THOMANSCHEFSKY UH, 1990, THESIS CORNELL U
[28]   MEASUREMENTS OF CONDUCTIVITY NEAR THE METAL-INSULATOR CRITICAL-POINT [J].
THOMAS, GA ;
PAALANEN, M ;
ROSENBAUM, TF .
PHYSICAL REVIEW B, 1983, 27 (06) :3897-3900
[29]   RESISTIVITY-DOPANT DENSITY RELATIONSHIP FOR BORON-DOPED SILICON [J].
THURBER, WR ;
MATTIS, RL ;
LIU, YM ;
FILLIBEN, JJ .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1980, 127 (10) :2291-2294
[30]   RESISTIVITY-DOPANT DENSITY RELATIONSHIP FOR PHOSPHORUS-DOPED SILICON [J].
THURBER, WR ;
MATTIS, RL ;
LIU, YM ;
FILLIBEN, JJ .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1980, 127 (08) :1807-1812