GROWTH AND OPTICAL-DEVICE EVALUATION OF P-TYPE CONDUCTIVE LEC GAAS CO-DOPED WITH IN AND ZN

被引:1
作者
FUJII, T [1 ]
FUKUDA, T [1 ]
机构
[1] OPTOELECTR JOINT RES LAB,NAKAHARA KU,KAWASAKI 211,JAPAN
关键词
D O I
10.1007/BF02655493
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
引用
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页码:405 / 409
页数:5
相关论文
共 11 条
[1]   SOLUBILITIES + DISTRIBUTION COEFFICIENTS OF ZN IN GAAS + GAP [J].
CHANG, LL ;
PEARSON, GL .
JOURNAL OF PHYSICS AND CHEMISTRY OF SOLIDS, 1964, 25 (01) :23-&
[2]   GROWTH OF SI AND IN DOUBLE-DOPED DISLOCATION-FREE CONDUCTIVE GAAS CRYSTAL BY THE LEC TECHNIQUE [J].
FUJII, T ;
NAKAJIMA, M ;
FUKUDA, T .
MATERIALS LETTERS, 1986, 4 (04) :189-193
[3]  
FUJII T, UNPUB J CRYST GROWTH
[4]   DISLOCATION-FREE GAAS AND INP CRYSTALS BY ISOELECTRONIC DOPING [J].
JACOB, G ;
DUSEAUX, M ;
FARGES, JP ;
VANDENBOOM, MMB ;
ROKSNOER, PJ .
JOURNAL OF CRYSTAL GROWTH, 1983, 61 (02) :417-424
[5]  
KOBAYASHI T, 1986, P SEMIINSULATING 3 5, P17
[6]  
KRESSEL H, 1977, SEMICONDUCTOR LASERS, P306
[7]  
Lee R. E., 1984, GaAs IC Symposium Technical Digest 1984 (Cat. No. 84CH2065-1), P45
[8]   EFFECT OF DOPING ON FORMATION OF DISLOCATION-STRUCTURE IN SEMICONDUCTOR CRYSTALS [J].
MILVIDSKY, MG ;
OSVENSKY, VB ;
SHIFRIN, SS .
JOURNAL OF CRYSTAL GROWTH, 1981, 52 (APR) :396-403
[9]   STRIATIONS IN UNDOPED SEMI-INSULATING LEC GAAS [J].
NAKAJIMA, M ;
KATSUMATA, T ;
TERASHIMA, K ;
ISHIDA, K .
JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS, 1985, 24 (01) :L65-L68
[10]   DEFECT STRUCTURE INTRODUCED DURING OPERATION OF HETEROJUNCTION GAAS LASERS [J].
PETROFF, P ;
HARTMAN, RL .
APPLIED PHYSICS LETTERS, 1973, 23 (08) :469-471