ETCHING AND FILM FORMATION IN CF3BR PLASMAS - SOME QUALITATIVE OBSERVATIONS AND THEIR GENERAL IMPLICATIONS

被引：47

作者：

FLAMM, DL

COWAN, PL

GOLOVCHENKO, JA

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1980年 / 17卷 / 06期

关键词：

D O I：

10.1116/1.570667

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：1341 / 1347

页数：7

共 34 条

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