A FURTHER CALIBRATION OF THE HARWELL SERIES-II BI-IMPLANTED RBS STANDARDS

被引:14
作者
JACKMAN, TE
DAVIES, JA
CHIVERS, D
机构
[1] AERE, HARWELL OX11 0RA, OXON, ENGLAND
[2] CHALK RIVER NUCL LAB, CHALK RIVER K0J 1J0, ONTARIO, CANADA
关键词
D O I
10.1016/S0168-583X(87)80070-8
中图分类号
TH7 [仪器、仪表];
学科分类号
0804 ; 080401 ; 081102 ;
摘要
引用
收藏
页码:345 / 347
页数:3
相关论文
共 3 条
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[2]   CALIBRATION OF THE HARWELL SERIES-II BI-IMPLANTED RBS STANDARDS [J].
DAVIES, JA ;
JACKMAN, TE ;
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WATJEN, U ;
CHIVERS, D .
NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 1986, 15 (1-6) :238-240
[3]   CHARACTERIZATION OF A NEW BATCH OF ION-IMPLANTED BI IN SILICON SPECIMENS FOR USE AS PRIMARY REFERENCE SURFACE STANDARDS [J].
MITCHELL, IV ;
ESCHBACH, HL ;
AVALDI, L ;
DOBMA, W .
NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH, 1983, 218 (1-3) :91-96