SECONDARY ION EMISSION FOR SURFACE AND IN-DEPTH ANALYSIS OF TANTALUM THIN-FILMS

被引：64

作者：

MORABITO, JM

LEWIS, RK

机构：

[1] BELL TEL LABS INC,ALLENTOWN,PA 18103

[2] CAMECA INSTR,ELMSFORD,NY 10523

来源：

关键词：

D O I：

10.1021/ac60328a037

中图分类号：

O65 [分析化学];

学科分类号：

070302 ; 081704 ;

摘要：

引用

页码：869 / 880

页数：12

共 32 条

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[5] BENNINGHOVEN A, 1972, SEP INT C ION SURF I
[6] SECONDARY POSITIVE ION EMISSION FROM METAL SURFACES
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[J]. JOURNAL OF APPLIED PHYSICS, 1959, 30 (01) : 1 - 8
[7] IONS SPUTTERED FROM COPPER
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