ELECTROMECHANICAL PROPERTIES AND ELECTRON TUNNELLING IN KTAO3

被引：17

作者：

HOCHLI, UT

BOATNER, LA

机构：

[1] IBM CORP,RES LAB,CH-8803 RUSCHLIKON,SWITZERLAND

[2] ECOLE POLYTECH FED LAUSANNE,PHYS EXPTL LAB,CH-1007 LAUSANNE,SWITZERLAND

来源：

JOURNAL OF PHYSICS C-SOLID STATE PHYSICS | 1977年 / 10卷 / 21期

关键词：

D O I：

10.1088/0022-3719/10/21/019

中图分类号：

O469 [凝聚态物理学];

学科分类号：

070205 ;

摘要：

引用

收藏

页码：4319 / 4333

页数：15

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