AR+ LASER-INDUCED FORWARD TRANSFER (LIFT) - A NOVEL METHOD FOR MICROMETER-SIZE SURFACE PATTERNING

被引：53

作者：

TOTH, Z ^{[1
]}

SZORENYI, T ^{[1
]}

TOTH, AL ^{[1
]}

机构：

[1] INST TECH PHYS,H-1325 BUDAPEST,HUNGARY

来源：

APPLIED SURFACE SCIENCE | 1993年 / 69卷 / 1-4期

基金：

美国国家科学基金会; 匈牙利科学研究基金会;

关键词：

D O I：

10.1016/0169-4332(93)90525-G

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

As a result of a systematic study on laser-induced forward transfer of tungsten (W) thin films by a focused Ar+ laser (lambda = 514 nm, 2w0 = 3 mum), it is shown that deposition of 2-3 mum diameter W spots of 100 nm thickness and 100% coverage is attainable at low processing powers (50-100 mW).

引用

收藏

页码：317 / 320

页数：4

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