OPTIMIZED KINOFORM STRUCTURES FOR HIGHLY EFFICIENT FAN-OUT ELEMENTS

被引：97

作者：

PRONGUE, D ^{[1
]}

HERZIG, HP ^{[1
]}

DANDLIKER, R ^{[1
]}

GALE, MT ^{[1
]}

机构：

[1] PAUL SCHERRER INST,CH-8048 ZURICH,SWITZERLAND

来源：

APPLIED OPTICS | 1992年 / 31卷 / 26期

关键词：

FAN-OUT; KINOFORM; PHASE GRATING; COMPUTER-GENERATED HOLOGRAM; HOLOGRAPHIC OPTICAL ELEMENT;

D O I：

10.1364/AO.31.005706

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

We discuss the realization of highly efficient fan-out elements. Laser-beam writing lithography is available now for fabricating smooth surface relief microstructures. We develop several methods for optimizing microstructure profiles. Only a small number of parameters in the object plane are necessary for determining the kinoform. This simplifies the calculation of M x N arrays also for large M and N. Experimental results for a 9-beam fan-out element are presented.

引用

页码：5706 / 5711

页数：6

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