DIMERIZATION INDUCED BE SEGREGATION IN GAAS

被引:5
作者
CUNNINGHAM, JE
GOOSSEN, KW
CHIU, TH
WILLIAMS, MD
JAN, W
STORZ, F
机构
[1] AT and T Bell Laboratories, Holmdel
关键词
D O I
10.1063/1.108744
中图分类号
O59 [应用物理学];
学科分类号
摘要
We report the observation of a Be segregation rate in GaAs that depends linearly on Be content. When delta-Be is codoped with delta-Si this segregation dependence changes and is observed to follow a model of segregation we develop based on Be dimerization. Further, we present the first evidence that GaAs surfaces order upon delta-Be deposition. The observed surface reconstructions could also result from Be dimerization. The energy gained from dimerization causes Be to segregate during growth.
引用
收藏
页码:1236 / 1238
页数:3
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