ION-BEAM MIXING OF METAL-SEMICONDUCTOR EUTECTIC SYSTEMS

被引：73

作者：

LAU, SS

TSAUR, BY

VONALLMEN, M

MAYER, JW

STRITZKER, B

WHITE, CW

APPLETON, B

机构：

[1] CALTECH, PASADENA, CA 91125 USA

[2] OAK RIDGE NATL LAB, OAK RIDGE, TN 37830 USA

来源：

NUCLEAR INSTRUMENTS & METHODS | 1981年 / 182卷 / APR期

关键词：

D O I：

10.1016/0029-554X(81)90676-5

中图分类号：

TH7 [仪器、仪表];

学科分类号：

0804 ; 080401 ; 081102 ;

摘要：

引用

页码：97 / 105

页数：9

共 15 条

[1]

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KANAYAMA, T ;

TANOUE, H ;

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APPLIED PHYSICS LETTERS, 1979, 35 (03) :222-224

[4]

LAU SS, 1978, THIN FILMS INTERDIFF, P243

[5]

MAGIN P, 1980, PHYS REV B, V21, P3047

[6] ION-INDUCED SILICIDE FORMATION IN NIOBIUM THIN-FILMS [J].

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RADIATION EFFECTS AND DEFECTS IN SOLIDS, 1979, 42 (3-4) :217-226

[7] ION-BEAM-INDUCED REACTIONS IN METAL-SEMICONDUCTOR AND METAL-METAL THIN-FILM STRUCTURES [J].

MAYER, JW ;

TSAUR, BY ;

LAU, SS ;

HUNG, LS .

NUCLEAR INSTRUMENTS & METHODS, 1981, 182 (APR) :1-13

[8]

PREDECKI P, 1965, T METALL SOC AIME, V233, P1438

[9] ION-BEAM-INDUCED SILICIDE FORMATION [J].

TSAUR, BY ;

LIAU, ZL ;

MAYER, JW .

APPLIED PHYSICS LETTERS, 1979, 34 (02) :168-170

[10] MICROALLOYING BY ION-BEAM MIXING [J].

TSAUR, BY ;

LAU, SS ;

HUNG, LS ;

MAYER, JW .

NUCLEAR INSTRUMENTS & METHODS, 1981, 182 (APR) :67-77

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