ELECTROSTATIC-PROBE MEASUREMENTS FOR MICROWAVE PLASMA-ASSISTED CHEMICAL VAPOR-DEPOSITION OF DIAMOND

被引：20

作者：

CERIO, FM ^{[1
]}

WEIMER, WA ^{[1
]}

机构：

[1] USN,CTR WEAP,RES DEPT,DIV CHEM,CHINA LAKE,CA 93555

来源：

APPLIED PHYSICS LETTERS | 1991年 / 59卷 / 26期

关键词：

D O I：

10.1063/1.105683

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

The electron energy and density in a diamond microwave plasma-assisted chemical vapor deposition reactor are determined using a double-electrostatic-probe technique. For a reactor feed gas composition of 2% CH4, 1% O2 in H-2, electron temperatures of 6 eV and electron densities of approximately 1.0 X 10(11) cm-3 were measured. These values are consistent with optical emission spectroscopic results. The electron temperature is not strongly dependent on the amount of O2 added to the reactor feed mixture, indicating that the plasma essentially retains the energetic parameters of a hydrogen plasma.

引用

页码：3387 / 3389

页数：3

共 19 条

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