INTERSTITIAL OXYGEN DETERMINATION IN HEAVILY DOPED SILICON

被引:10
作者
BORGHESI, A
GEDDO, M
GUIZZETTI, G
GERANZANI, P
机构
[1] UNIV MODENA,DEPARTIMENTO FIS,I-41100 MODENA,ITALY
[2] MEMC ELECTR MAT SPA,I-28100 NOVARA,ITALY
关键词
D O I
10.1063/1.346647
中图分类号
O59 [应用物理学];
学科分类号
摘要
Systematic infrared transmission measurements have been performed on heavily Sb-doped (up to 2×1018 atoms/cm3) silicon samples. The interstitial oxygen content is obtained analyzing the optical response near the 1107-cm-1 oxygen absorption band with a new technique based on a curved baseline, accounting for free-carrier absorption. The results are discussed and compared with those obtained for the same samples by a short baseline technique and by secondary-ion mass spectroscopy (SIMS) analysis. Regression straight-line fits, relative to two lots of 16 samples each, show a good linear correlation between infrared (IR) and SIMS data, although the IR estimates are consistently lower than those obtained by SIMS.
引用
收藏
页码:1655 / 1660
页数:6
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