CHARACTERIZATION OF CVD MOLYBDENUM THIN FILMS

被引：11

作者：

ELHOSHY, AH

机构：

来源：

关键词：

D O I：

10.1149/1.2407901

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

页码：2028 / &

共 7 条

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[2] RESISTIVITY AND TEMPERATURE COEFFICIENT OF PURE MOLYBDENUM [J].

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[3]

KENNICOTT PR, PRIVATE COMMUNICATIO

[4]

PTUSHINSKII YG, 1968, UKR FIX ZH, V13, P221

[5]

SETO DK, ELECTROCHEMICAL SOC

[6]

SMITH CS, 1953, J MET, V5, P81

[7] CHEMICAL DEPOSITION OF MO ON SI [J].

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CHOU, HK ;

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NISHI, T .