SMOOTH DIAMOND FILMS GROWN BY HOT-FILAMENT CHEMICAL-VAPOR-DEPOSITION ON POSITIVELY BIASED SILICON SUBSTRATES

被引:18
作者
POPOVICI, G [1 ]
CHAO, CH [1 ]
PRELAS, MA [1 ]
CHARLSON, EJ [1 ]
MEESE, JM [1 ]
机构
[1] UNIV MISSOURI,DEPT ELECT ENGN,COLUMBIA,MO 65211
关键词
D O I
10.1557/JMR.1995.2011
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Diamond films have been grown by hot filament chemical vapor deposition (CVD) on mirror-polished positively biased Si substrates. Very smooth films a few micrometers thick were obtained in only 30 min. SEM, x-ray diffraction patterns, and Raman were used to characterize the films. Not only diamond but other carbon phases, were also detected. The initial structure showed a high density of defects and large stresses. Structural changes in time were found to occur with films apparently undergoing a phase transformation.
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收藏
页码:2011 / 2016
页数:6
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