THE STRUCTURE OF VERY THIN GOLD LAYERS PRODUCED BY METALORGANIC CHEMICAL-VAPOR-DEPOSITION

被引：6

作者：

ALLEN, DW

HAIGH, J

机构：

[1] Division of Chemistry, School of Science, Sheffield Hallam University, Sheffield

来源：

APPLIED ORGANOMETALLIC CHEMISTRY | 1995年 / 9卷 / 01期

关键词：

MOCVD; METALORGANIC DEPOSITION; METAL LAYER; GOLD;

D O I：

10.1002/aoc.590090112

中图分类号：

O69 [应用化学];

学科分类号：

081704 ;

摘要：

Gold layers have been deposited from methyl(triethylphosphine)gold(I) by metalorganic chemical vapour deposition (MOCVD) and their structure and composition examined. At two deposition temperatures the layers have an underlying structure which is fine-grained in the case of the 500 degrees C layer and therefore of interest for thin-layer device structures. Impurity levels are low in this layer.

引用

页码：83 / 88

页数：6

共 7 条

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