PREPARATION OF ZNO FILMS BY LOW-PRESSURE ORGANOMETALLIC CHEMICAL-VAPOR-DEPOSITION

被引:4
作者
KOBAYASHI, K
MATSUBARA, T
MATSUSHIMA, S
OKADA, G
机构
关键词
D O I
10.1246/cl.1993.2133
中图分类号
O6 [化学];
学科分类号
0703 ;
摘要
Using zinc acetate as a precursor, ZnO films have been prepared on sapphire (1 102BAR) substrates at pressures of 2.7 x 10(-2) and 6.7 x 10(-3) Pa. The deposition rate increased with substrate temperature. The crystal structure of ZnO film was dependent on the substrate temperature and H2O partial pressure. In particular, oriented (11 20BAR) ZnO films have been formed at 350-degrees-C at 2.7 x 10(-2) Pa.
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页码:2133 / 2136
页数:4
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