MICROSTRUCTURE OF INDIUM TIN OXIDE-FILMS PRODUCED BY THE DC SPUTTERING TECHNIQUE

被引：25

作者：

CHAUDHURI, S

BHATTACHARYYA, J

PAL, AK

机构：

[1] Indian Assoc for the Cultivation of, Science, Calcutta, India, Indian Assoc for the Cultivation of Science, Calcutta, India

来源：

THIN SOLID FILMS | 1987年 / 148卷 / 03期

关键词：

ELECTRIC PROPERTIES - METALLOGRAPHY - Microstructures - SPUTTERING;

D O I：

10.1016/0040-6090(87)90321-X

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

The effect of grain growth in indium tin oxide films deposited using the d. c. sputtering technique was studied as a function of annealing temperature. The results were correlated with the observed electrical properties.

引用

页码：279 / 284

页数：6

共 22 条

[1] ARONSON AJ, 1979, 23RD P SPUTT SCH ARC
[2] PREPARATION AND CHARACTERIZATION OF INDIUM TIN OXIDE-FILMS PRODUCED BY THE DC SPUTTERING TECHNIQUE
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[9] EFFECTS OF HEAT-TREATMENT ON OPTICAL AND ELECTRICAL-PROPERTIES OF INDIUM-TIN OXIDE-FILMS
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[10] CHEMICAL VAPOR-DEPOSITION OF TRANSPARENT ELECTRICALLY CONDUCTING LAYERS OF INDIUM OXIDE DOPED WITH TIN
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[J]. THIN SOLID FILMS, 1975, 29 (01) : 155 - 163

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