ELECTRON-BEAM IRRADIATION EFFECTS IN THICK OXIDE MOS CAPACITORS

被引：12

作者：

THOMAS, AG

BUTLER, SR

GOLDSTEIN, JI

PARRY, PD

机构：

[1] WESTERN ELECT CO INC, KANSAS CITY WORKS, LEES SUMMIT, MO 64063 USA

[2] LEHIGH UNIV, MAT RES CTR, BETHLEHEM, PA 18015 USA

[3] WESTERN ELECT ENGN RES CTR, PRINCETON, NJ 08540 USA

来源：

IEEE TRANSACTIONS ON NUCLEAR SCIENCE | 1974年 / NS21卷 / 04期

关键词：

D O I：

10.1109/TNS.1974.6499261

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

页码：14 / 19

页数：6

共 19 条

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