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BULK-QUALITY BIPOLAR-TRANSISTORS FABRICATED IN LOW-TEMPERATURE (TDEP=800-DEGREES-C) EPITAXIAL SILICON
被引:13
作者
:
BURGER, WR
论文数:
0
引用数:
0
h-index:
0
BURGER, WR
REIF, R
论文数:
0
引用数:
0
h-index:
0
REIF, R
机构
:
来源
:
APPLIED PHYSICS LETTERS
|
1987年
/ 50卷
/ 20期
关键词
:
D O I
:
10.1063/1.97850
中图分类号
:
O59 [应用物理学];
学科分类号
:
摘要
:
引用
收藏
页码:1447 / 1449
页数:3
相关论文
共 7 条
[1]
BIPOLAR-TRANSISTOR FABRICATION IN LOW-TEMPERATURE (745-DEGREES-C) ULTRA-LOW-PRESSURE CHEMICAL-VAPOR-DEPOSITED EPITAXIAL SILICON
BURGER, WR
论文数:
0
引用数:
0
h-index:
0
机构:
MIT,DEPT CHEM ENGN,CAMBRIDGE,MA 02139
BURGER, WR
COMFORT, JH
论文数:
0
引用数:
0
h-index:
0
机构:
MIT,DEPT CHEM ENGN,CAMBRIDGE,MA 02139
COMFORT, JH
GARVERICK, LM
论文数:
0
引用数:
0
h-index:
0
机构:
MIT,DEPT CHEM ENGN,CAMBRIDGE,MA 02139
GARVERICK, LM
YEW, TR
论文数:
0
引用数:
0
h-index:
0
机构:
MIT,DEPT CHEM ENGN,CAMBRIDGE,MA 02139
YEW, TR
REIF, R
论文数:
0
引用数:
0
h-index:
0
机构:
MIT,DEPT CHEM ENGN,CAMBRIDGE,MA 02139
REIF, R
[J].
IEEE ELECTRON DEVICE LETTERS,
1987,
8
(04)
: 168
-
170
[2]
THE EFFECT OF DOPING ON THE FORMATION OF SWIRL DEFECTS IN DISLOCATION-FREE CZOCHRALSKI-GROWN SILICON-CRYSTALS
DEKOCK, AJR
论文数:
0
引用数:
0
h-index:
0
DEKOCK, AJR
VANDEWIJGERT, WM
论文数:
0
引用数:
0
h-index:
0
VANDEWIJGERT, WM
[J].
JOURNAL OF CRYSTAL GROWTH,
1980,
49
(04)
: 718
-
734
[3]
LOW-TEMPERATURE SILICON EPITAXY USING LOW-PRESSURE CHEMICAL VAPOR-DEPOSITION WITH AND WITHOUT PLASMA ENHANCEMENT
DONAHUE, TJ
论文数:
0
引用数:
0
h-index:
0
DONAHUE, TJ
BURGER, WR
论文数:
0
引用数:
0
h-index:
0
BURGER, WR
REIF, R
论文数:
0
引用数:
0
h-index:
0
REIF, R
[J].
APPLIED PHYSICS LETTERS,
1984,
44
(03)
: 346
-
348
[4]
Grove A. S., 1967, PHYS TECHNOL S, P180
[5]
LOW-TEMPERATURE SILICON EPITAXY BY ULTRAHIGH-VACUUM CHEMICAL VAPOR-DEPOSITION
MEYERSON, BS
论文数:
0
引用数:
0
h-index:
0
MEYERSON, BS
[J].
APPLIED PHYSICS LETTERS,
1986,
48
(12)
: 797
-
799
[6]
REIF R, 1986, Patent No. 4579609
[7]
Sze S. M., 1981, PHYSICS SEMICONDUCTO, P92
←
1
→
共 7 条
[1]
BIPOLAR-TRANSISTOR FABRICATION IN LOW-TEMPERATURE (745-DEGREES-C) ULTRA-LOW-PRESSURE CHEMICAL-VAPOR-DEPOSITED EPITAXIAL SILICON
BURGER, WR
论文数:
0
引用数:
0
h-index:
0
机构:
MIT,DEPT CHEM ENGN,CAMBRIDGE,MA 02139
BURGER, WR
COMFORT, JH
论文数:
0
引用数:
0
h-index:
0
机构:
MIT,DEPT CHEM ENGN,CAMBRIDGE,MA 02139
COMFORT, JH
GARVERICK, LM
论文数:
0
引用数:
0
h-index:
0
机构:
MIT,DEPT CHEM ENGN,CAMBRIDGE,MA 02139
GARVERICK, LM
YEW, TR
论文数:
0
引用数:
0
h-index:
0
机构:
MIT,DEPT CHEM ENGN,CAMBRIDGE,MA 02139
YEW, TR
REIF, R
论文数:
0
引用数:
0
h-index:
0
机构:
MIT,DEPT CHEM ENGN,CAMBRIDGE,MA 02139
REIF, R
[J].
IEEE ELECTRON DEVICE LETTERS,
1987,
8
(04)
: 168
-
170
[2]
THE EFFECT OF DOPING ON THE FORMATION OF SWIRL DEFECTS IN DISLOCATION-FREE CZOCHRALSKI-GROWN SILICON-CRYSTALS
DEKOCK, AJR
论文数:
0
引用数:
0
h-index:
0
DEKOCK, AJR
VANDEWIJGERT, WM
论文数:
0
引用数:
0
h-index:
0
VANDEWIJGERT, WM
[J].
JOURNAL OF CRYSTAL GROWTH,
1980,
49
(04)
: 718
-
734
[3]
LOW-TEMPERATURE SILICON EPITAXY USING LOW-PRESSURE CHEMICAL VAPOR-DEPOSITION WITH AND WITHOUT PLASMA ENHANCEMENT
DONAHUE, TJ
论文数:
0
引用数:
0
h-index:
0
DONAHUE, TJ
BURGER, WR
论文数:
0
引用数:
0
h-index:
0
BURGER, WR
REIF, R
论文数:
0
引用数:
0
h-index:
0
REIF, R
[J].
APPLIED PHYSICS LETTERS,
1984,
44
(03)
: 346
-
348
[4]
Grove A. S., 1967, PHYS TECHNOL S, P180
[5]
LOW-TEMPERATURE SILICON EPITAXY BY ULTRAHIGH-VACUUM CHEMICAL VAPOR-DEPOSITION
MEYERSON, BS
论文数:
0
引用数:
0
h-index:
0
MEYERSON, BS
[J].
APPLIED PHYSICS LETTERS,
1986,
48
(12)
: 797
-
799
[6]
REIF R, 1986, Patent No. 4579609
[7]
Sze S. M., 1981, PHYSICS SEMICONDUCTO, P92
←
1
→