ELECTRON RESISTS PREPARED FROM COLLOIDAL DISPERSIONS OF POLY(METHYL METHACRYLATE) IN NON-SOLVENTS

被引：2

作者：

COWLEY, DR ^{[1
]}

PRICE, C ^{[1
]}

HARDY, CJ ^{[1
]}

机构：

[1] UNIV MANCHESTER,DEPT ELECT ENGN,MANCHESTER M13 9PL,LANCASHIRE,ENGLAND

来源：

关键词：

D O I：

10.1016/0032-3861(80)90129-9

中图分类号：

O63 [高分子化学（高聚物）];

学科分类号：

070305 ; 080501 ; 081704 ;

摘要：

引用

页码：1356 / 1357

页数：2

共 6 条

[1] ELECTRON-IRRADIATION OF POLY(OLEFIN SULFONES) - APPLICATION TO ELECTRON-BEAM RESISTS
BOWDEN, MJ
THOMPSON, LF
[J]. JOURNAL OF APPLIED POLYMER SCIENCE, 1973, 17 (10) : 3211 - 3221
[2] Broers A, 1965, MICROELECTRON RELIAB, V4, P103
[3] HATZAKIS M, 1974, J VAC SCI TECHNOL, V2, P95
[4] HATZAKIS M, 1971, 11TH S EL ION LAS BE, P337
[5] ELECTRON BEAM FABRICATION OF MICRON TRANSISTORS
MAGDO, S
HATZAKIS, M
TING, CH
[J]. IBM JOURNAL OF RESEARCH AND DEVELOPMENT, 1971, 15 (06) : 446 - &
[6] ELECTRON-BEAM EXPOSURE OF POLYMERIC RESISTS
SOBANSKI, J
SCHULER, A
CHABICOV.R
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1972, 9 (01): : 358 - &