ELECTRON-BEAM EXPOSURE OF POLYMERIC RESISTS

被引：2

作者：

SOBANSKI, J

SCHULER, A

CHABICOV.R

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1972年 / 9卷 / 01期

关键词：

D O I：

10.1116/1.1316612

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

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页码：358 / &

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