SINGLE-CRYSTALLINE, SINGLE-DOMAIN EPITAXY OF PBTIO3 THIN-FILMS BY METALORGANIC CHEMICAL-VAPOR-DEPOSITION

Single-crystalline and single-domain PbTiO3 films with thickness of 3000 Angstrom have been prepared by metalorganic chemical vapor deposition (MOCVD), using metalorganic precursors of tetra-ethyl-lead and iso-propoxide titanium. The nature of single-crystalline epitaxy and single domain of as-grown films was characterized by x-ray diffraction (XRD), synchrotron radiation (SR), and Rutherford backscattering (RES). Using atomic force microscopy (AFM), the evidence of layer-by-layer growth was observed. The growth steps on the surface may be attributable to the formation of single-crystalline and single-domain PbTiO3 film with 3000-Angstrom thickness. (C) 1995 American Institute of Physics.