STUDY AND IMPROVEMENT OF THE ADHESION OF CHROMIUM THIN-FILMS DEPOSITED BY MAGNETRON SPUTTERING

被引：33

作者：

GUILBAUDMASSEREAU, V

CELERIER, A

MACHET, J

机构：

[1] L.M.C.T.S. URA 320, Faculté des Sciences, 87060 Limoges cedex

来源：

THIN SOLID FILMS | 1995年 / 258卷 / 1-2期

关键词：

CHROMIUM; COATINGS; PHYSICAL VAPOR DEPOSITION; STRESS;

D O I：

10.1016/0040-6090(94)06360-5

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Pure and doped chromium coatings are deposited on glass substrates by magnetron sputtering. By varying the reactive gas content, tensile intrinsic stress transitions to compressive ones are observed. Scratch tests have demonstrated a good adhesion for doped chromium coatings which are in a compressive state. Doped nitrogen chromium films have the highest values of the critical load at which adhesion fails (17 N). Pure chromium coatings are in tensile stresses and the critical value is only 11 N. Adhesion and intrinsic stress dependences are shown. These results are correlated with average crystallographic grain size, preferential crystalline orientation, morphology and microhardness.

引用

页码：185 / 193

页数：9

共 23 条

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