TRIBOLOGICAL CHARACTERISTICS OF SIO2-FILMS INVESTIGATED BY SCANNING PROBE MICROSCOPY

被引：4

作者：

MIYAMOTO, T

SERIKAWA, T

HIRONO, S

JIANG, Z

BOGY, DB

KANEKO, R

机构：

[1] UNIV CALIF BERKELEY, BERKELEY, CA 94720 USA

[2] NIPPON TELEGRAPH & TEL PUBL CORP, ADV TECHNOL CORP, MUSASHINO, TOKYO 180, JAPAN

来源：

IEEE TRANSACTIONS ON MAGNETICS | 1995年 / 31卷 / 06期

关键词：

D O I：

10.1109/20.490256

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

Tribological characteristics of newly-proposed SiO2 films deposited in hydrogen-argon mixtures, the Si substrate, the fused quartz target, and thermally-grown SiO2 were investigated by simultaneously measuring the friction and wear using scanning probe microscopy, At low normal loads, wear did not appear when the friction force increased linearly with load, however, significant wear occurred when the friction force increased rapidly at higher loads. The wear regime of SiO2 films closely agreed with the friction change as simultaneously measured in the same area. The friction and wear of the sputtered SiO2 films were lowest at a 30% hydrogen concentration. The film deposited at 30% hydrogen had very similar wear durability to thermally-grown SiO2, but higher durability than fused quartz target.

引用

页码：3018 / 3020

页数：3