OPTICAL, THERMOMECHANICAL AND MOS PROPERTIES OF ZNO-BASED AND PBO-BASED GLASSES

被引：8

作者：

KOBAYASHI, K

机构：

[1] Toshiba ULSI Research Center, Kawasaki, 210, 1 Komukai, Toshiba-cho

来源：

JOURNAL OF NON-CRYSTALLINE SOLIDS | 1994年 / 167卷 / 1-2期

关键词：

D O I：

10.1016/0022-3093(94)90382-4

中图分类号：

TQ174 [陶瓷工业]; TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

Low temperature reflow glasses on MOS capacitors were studied in order to assess glass suitability for MOS device electric insulators. ZnO-based glasses with flow points below 630-degrees-C are promising candidates for MOS capacitor passivation. MOS capacitors passivated by PbO-based glasses revealed noticeable DELTAV(G) shifts, due to the high polarizability, which is unsuitable for passivation. PbO-based glasses show flow points below 370-degrees-C, but film formation for PbO-based glasses is more difficult than for ZnO-based glasses. Glass film formation for MOS capacitors is briefly discussed.

引用

页码：180 / 184

页数：5

共 14 条

[1] SILICA-BASED OXIDE SYSTEMS .2. DETERMINATION OF SILICA-BASED, LOW FLOW TEMPERATURE GLASSES FOR ELECTRONIC APPLICATION FROM RELATIONS BETWEEN GLASS-TRANSITION, FLOW, AND LIQUIDUS TEMPERATURES [J].