CARBON-ACCEPTOR PAIR CENTERS (X-CENTERS) IN SILICON

被引:70
作者
JONES, CE [1 ]
SCHAFER, D [1 ]
SCOTT, W [1 ]
HAGER, RJ [1 ]
机构
[1] HONEYWELL INC,CTR CORP TECHNOL,BLOOMINGTON,MN 55420
关键词
D O I
10.1063/1.329415
中图分类号
O59 [应用物理学];
学科分类号
摘要
引用
收藏
页码:5148 / 5158
页数:11
相关论文
共 28 条
[1]   NATURE OF THE 0.111-EV ACCEPTOR LEVEL IN INDIUM-DOPED SILICON [J].
BARON, R ;
BAUKUS, JP ;
ALLEN, SD ;
MCGILL, TC ;
YOUNG, MH ;
KIMURA, H ;
WINSTON, HV ;
MARSH, OJ .
APPLIED PHYSICS LETTERS, 1979, 34 (04) :257-259
[2]   NEW ACCEPTOR LEVEL IN INDIUM-DOPED SILICON [J].
BARON, R ;
YOUNG, MH ;
NEELAND, JK ;
MARSH, OJ .
APPLIED PHYSICS LETTERS, 1977, 30 (11) :594-596
[3]   3-DIMENSIONAL POOLE-FRENKEL EFFECT [J].
HARTKE, JL .
JOURNAL OF APPLIED PHYSICS, 1968, 39 (10) :4871-&
[4]  
HJALMARSON HP, 1979, THESIS U ILLINOIS
[5]   DEEP LEVEL TRANSIENT SPECTROSCOPY STUDIES OF TRAPPING PARAMETERS FOR CENTERS IN INDIUM-DOPED SILICON [J].
JONES, CE ;
JOHNSON, GE .
JOURNAL OF APPLIED PHYSICS, 1981, 52 (08) :5159-5163
[6]  
JONES CE, 1977, B AM PHYS SOC, V22, P382
[7]  
JONES CE, 1979, B AM PHYS SOC, V24, P276
[8]   FAST CAPACITANCE TRANSIENT APPARATUS - APPLICATION TO ZNO AND O CENTERS IN GAP PARANORMAL JUNCTIONS [J].
LANG, DV .
JOURNAL OF APPLIED PHYSICS, 1974, 45 (07) :3014-3022
[9]  
LUDWIG GW, 1962, SOLID STATE PHYS, V13, P223
[10]   MOLECULAR-ORBITAL TREATMENT FOR DEEP LEVELS IN SEMICONDUCTORS - SUBSTITUTIONAL NITROGEN AND LATTICE VACANCY IN DIAMOND [J].
MESSMER, RP ;
WATKINS, GD .
PHYSICAL REVIEW B, 1973, 7 (06) :2568-2590