SIMPLE NEGATIVE RESIST FOR DEEP ULTRAVIOLET, ELECTRON-BEAM, AND X-RAY-LITHOGRAPHY

被引：31

作者：

STEWART, KJ ^{[1
]}

HATZAKIS, M ^{[1
]}

SHAW, JM ^{[1
]}

SEEGER, DE ^{[1
]}

NEUMANN, E ^{[1
]}

机构：

[1] IBM CORP,DIV GEN TECHNOL,ESSEX JUNCTION,VT 05452

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1989年 / 7卷 / 06期

关键词：

D O I：

10.1116/1.584448

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

页码：1734 / 1739

页数：6

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