HYBRID E-BEAM-DEEP-UV EXPOSURE USING PORTABLE CONFORMABLE MASKING (PCM) TECHNIQUE

被引：61

作者：

LIN, BJ

CHANG, THP

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1979年 / 16卷 / 06期

关键词：

D O I：

10.1116/1.570269

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：1669 / 1671

页数：3

共 8 条

[1] CHANG THP, 1979, Patent No. 165395000
[2] NEW HYBRID (E-BEAM-X-RAY) EXPOSURE TECHNIQUE FOR HIGH ASPECT RATIO MICROSTRUCTURE FABRICATION
HATZAKIS, M
HOFER, D
CHANG, THP
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1979, 16 (06): : 1631 - 1634
[3] Lin B. J., 1977, IBM Technical Disclosure Bulletin, V20, P856
[4] OPTICAL MANIPULATION OF RESIST PROFILE IN CONFORMABLE PRINTING
LIN, BJ
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1978, 15 (03): : 1012 - 1015
[5] DEEP UV LITHOGRAPHY
LIN, BJ
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1975, 12 (06): : 1317 - 1320
[6] LIN BJ, 1979, SPIE P, V174
[7] LIN BJ, UNPUBLISHED
[8] METHOD FOR FABRICATING HIGH FREQUENCY SURFACE WAVE TRANSDUCERS
SMITH, HI
[J]. REVIEW OF SCIENTIFIC INSTRUMENTS, 1969, 40 (05) : 729 - &