AN ALUMINUM OXYNITRIDE FILM

被引：15

作者：

DEHUANG, W ^{[1
]}

LIANG, G ^{[1
]}

机构：

[1] CHINESE ACAD SCI,INST SEMICOND,BEIJING,PEOPLES R CHINA

来源：

THIN SOLID FILMS | 1991年 / 198卷 / 1-2期

关键词：

D O I：

10.1016/0040-6090(91)90339-Y

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

We report on an aluminum oxynitride (AlON) film which was successfully made using the reactiver r.f. sputtering method in an N2-O2 mixture. The fabrication process, atomic components, breakdown field and refractive index of the AlON film are shown in detail. The AlON film is a new polyfilm combining the good properties of Al2O3 and AlN, and it is very interesting with regard to optoelectronic devices and integrated optic circuits.

引用

页码：207 / 210

页数：4

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