CORRELATION BETWEEN RESISTANCE RATIOS AND ELECTROMIGRATION FAILURE IN ALUMINUM FILMS

被引：8

作者：

AUSTIN, PM

MAYADAS, AF

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1971年 / 8卷 / 04期

关键词：

D O I：

10.1116/1.1315211

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：606 / &

共 4 条

[1] ELECTROMIGRATION DAMAGE IN ALUMINUM FILM CONDUCTORS
ATTARDO, MJ
ROSENBERG, R
[J]. JOURNAL OF APPLIED PHYSICS, 1970, 41 (06) : 2381 - +
[2] DHEURLE FM, PRIVATE COMMUNICATIO
[3] RESISTIVITY AND STRUCTURE OF EVAPORATED ALUMINUM FILMS
MAYADAS, AF
FEDER, R
ROSENBERG, R
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1969, 6 (04): : 690 - +
[4] ELECTRICAL-RESISTIVITY MODEL FOR POLYCRYSTALLINE FILMS - CASE OF ARBITRARY REFLECTION AT EXTERNAL SURFACES
MAYADAS, AF
SHATZKES, M
[J]. PHYSICAL REVIEW B, 1970, 1 (04): : 1382 - &