ATOMIC CHLORINE CONCENTRATION AND GAS TEMPERATURE-MEASUREMENTS IN A PLASMA-ETCHING REACTOR

被引：51

作者：

WORMHOUDT, J ^{[1
]}

STANTON, AC ^{[1
]}

RICHARDS, AD ^{[1
]}

SAWIN, HH ^{[1
]}

机构：

[1] MIT,DEPT CHEM ENGN,CAMBRIDGE,MA 02139

来源：

JOURNAL OF APPLIED PHYSICS | 1987年 / 61卷 / 01期

关键词：

D O I：

10.1063/1.338846

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：142 / 148

页数：7

共 42 条

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