ANISOTROPIC ETCHING OF SIO2 IN LOW-FREQUENCY CF4/O2 AND NF3/AR PLASMAS

[1] ARIKADO T, 1981, PLASMA PROCESSING, V81, P66

[2] SURFACE STUDIES OF AND A MASS BALANCE MODEL FOR AR+ ION-ASSISTED CL-2 ETCHING OF SI [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1983, 1 (01): : 37 - 42

[3] BONDUR JA, 1981, PLASMA PROCESSING, V81, P180

[4] BRUCE RH, 1981, EL SOC EXT ABSTR, V81, P631

[5] Electronic energy transfer processes in fluorine-containing radicals: Singlet NF [J]. CHEMICAL PHYSICS LETTERS, 1970, 6 (05) : 465 - 467

[6] REACTION-KINETICS OF GROUND-STATE FLUORINE, F(2P), ATOMS .1. MEASUREMENT OF FLUORINE ATOM CONCENTRATIONS AND RATES OF REACTIONS F + CHF3 AND F + CL2 USING MASS-SPECTROMETRY [J]. CANADIAN JOURNAL OF CHEMISTRY-REVUE CANADIENNE DE CHIMIE, 1973, 51 (21): : 3596 - 3604

[7] Coburn J.W., 1982, PLASMA CHEM PLASMA P, V2, P1, DOI 10.1007/BF00566856

[8] OPTICAL-EMISSION SPECTROSCOPY OF REACTIVE PLASMAS - A METHOD FOR CORRELATING EMISSION INTENSITIES TO REACTIVE PARTICLE DENSITY [J]. JOURNAL OF APPLIED PHYSICS, 1980, 51 (06) : 3134 - 3136

[9] DEPENDENCE OF F-ATOM DENSITY ON PRESSURE AND FLOW-RATE IN CF4 GLOW-DISCHARGES AS DETERMINED BY EMISSION-SPECTROSCOPY [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1981, 18 (02): : 353 - 356

[10] PLASMA-ETCHING OF SI AND SIO2 IN SF6-O2 MIXTURES [J]. JOURNAL OF APPLIED PHYSICS, 1981, 52 (01) : 162 - 167

[1] ARIKADO T, 1981, PLASMA PROCESSING, V81, P66

[2] SURFACE STUDIES OF AND A MASS BALANCE MODEL FOR AR+ ION-ASSISTED CL-2 ETCHING OF SI [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1983, 1 (01): : 37 - 42

[3] BONDUR JA, 1981, PLASMA PROCESSING, V81, P180

[4] BRUCE RH, 1981, EL SOC EXT ABSTR, V81, P631

[5] Electronic energy transfer processes in fluorine-containing radicals: Singlet NF [J]. CHEMICAL PHYSICS LETTERS, 1970, 6 (05) : 465 - 467

[6] REACTION-KINETICS OF GROUND-STATE FLUORINE, F(2P), ATOMS .1. MEASUREMENT OF FLUORINE ATOM CONCENTRATIONS AND RATES OF REACTIONS F + CHF3 AND F + CL2 USING MASS-SPECTROMETRY [J]. CANADIAN JOURNAL OF CHEMISTRY-REVUE CANADIENNE DE CHIMIE, 1973, 51 (21): : 3596 - 3604

[7] Coburn J.W., 1982, PLASMA CHEM PLASMA P, V2, P1, DOI 10.1007/BF00566856

[8] OPTICAL-EMISSION SPECTROSCOPY OF REACTIVE PLASMAS - A METHOD FOR CORRELATING EMISSION INTENSITIES TO REACTIVE PARTICLE DENSITY [J]. JOURNAL OF APPLIED PHYSICS, 1980, 51 (06) : 3134 - 3136

[9] DEPENDENCE OF F-ATOM DENSITY ON PRESSURE AND FLOW-RATE IN CF4 GLOW-DISCHARGES AS DETERMINED BY EMISSION-SPECTROSCOPY [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1981, 18 (02): : 353 - 356

[10] PLASMA-ETCHING OF SI AND SIO2 IN SF6-O2 MIXTURES [J]. JOURNAL OF APPLIED PHYSICS, 1981, 52 (01) : 162 - 167