共 11 条
- [1] FLOW-RATE EFFECTS IN PLASMA ETCHING [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1978, 15 (02): : 329 - 332
- [6] OPTICAL DETECTOR TO MONITOR PLASMA ETCHING [J]. JOURNAL OF ELECTRONIC MATERIALS, 1978, 7 (03) : 429 - 440
- [8] Kalter H., 1978, Philips Technical Review, V38, P200
- [9] REACTANT SUPPLY IN REACTIVE ION ETCHING [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1979, 16 (02): : 404 - 406