LASER DIAGNOSTICS OF PLASMA-ETCHING - MEASUREMENT OF CL2+ IN A CHLORINE DISCHARGE

被引：91

作者：

DONNELLY, VM

FLAMM, DL

COLLINS, G

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1982年 / 21卷 / 03期

关键词：

D O I：

10.1116/1.571829

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：817 / 823

页数：7

共 15 条

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[4] END-POINT DETERMINATION OF ALUMINUM CCL4 PLASMA ETCHING BY OPTICAL EMISSION-SPECTROSCOPY
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[J]. JOURNAL OF APPLIED PHYSICS, 1980, 51 (10) : 5273 - 5276
[8] DONNELLY VM, UNPUB
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[10] FLAMM DL, 1982, J APPL PHYS, V53, P4553