UPDATED SYSTEM MODEL FOR X-RAY-LITHOGRAPHY

被引：32

作者：

KHAN, M

MOHAMMAD, L

XIAO, J

OCOLA, L

CERRINA, F

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1994年 / 12卷 / 06期

关键词：

D O I：

10.1116/1.587577

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

页码：3930 / 3935

页数：6

共 17 条

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[J]. MICROELECTRONIC ENGINEERING, 1992, 17 (1-4) : 135 - 140
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GUO, JZY
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[J]. IBM JOURNAL OF RESEARCH AND DEVELOPMENT, 1993, 37 (03) : 331 - 349
[9] SIMULTANEOUS-OPTIMIZATION OF SPECTRUM, SPATIAL COHERENCE, GAP, FEATURE BIAS, AND ABSORBER THICKNESS IN SYNCHROTRON-BASED X-RAY-LITHOGRAPHY
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