ON THE TEMPERATURE-DEPENDENCE OF MAJORITY CARRIER TRANSPORT IN HEAVILY ARSENIC-DOPED POLYCRYSTALLINE SILICON THIN-FILMS

被引:9
作者
CRESSLER, JD
HWANG, W
CHEN, TC
机构
关键词
D O I
10.1149/1.2096746
中图分类号
O646 [电化学、电解、磁化学];
学科分类号
081704 ;
摘要
引用
收藏
页码:794 / 804
页数:11
相关论文
共 63 条
[1]   TRANSPORT PROPERTIES OF POLYCRYSTALLINE SILICON FILMS [J].
BACCARANI, G ;
RICCO, B ;
SPADINI, G .
JOURNAL OF APPLIED PHYSICS, 1978, 49 (11) :5565-5570
[2]  
BLAKEMORE JS, 1962, SEMICONDUCTOR STATIS
[3]  
BOURRET A, 1985, POLYCRYSTALLINE SEMI
[4]  
BRODSKY MH, 1979, AMORPHOUS SEMICONDUC
[5]  
CHRZANOWSKAJESK.M, 1987, ELECTROCHEMICAL SOC, P490
[6]   GRAIN-SIZE AND RESISTIVITY OF LPCVD POLYCRYSTALLINE SILICON FILMS [J].
COLINGE, JP ;
DEMOULIN, E ;
DELANNAY, F ;
LOBET, M ;
TEMERSON, JM .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1981, 128 (09) :2009-2014
[7]   CHEMICAL VAPOR DEPOSITED POLYCRYSTALLINE SILICON. [J].
Cowher, M.E. ;
Sedgwick, T.O. .
1600, (119)
[8]  
CRESSLER JD, 1987, ELECTROCHEMICAL SOC, P472
[9]  
Fistul' V.I., 1969, HEAVILY DOPED SEMICO, VVolume 1
[10]   RESISTIVITY OF DOPED POLYCRYSTALLINE SILICON FILMS [J].
FRIPP, AL ;
SLACK, LH .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1973, 120 (01) :145-146