MULTILAYER FACILITIES REQUIRED FOR EXTREME-ULTRAVIOLET LITHOGRAPHY

被引：61

作者：

WINDT, DL

WASKIEWICZ, WK

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1994年 / 12卷 / 06期

关键词：

D O I：

10.1116/1.587449

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

页码：3826 / 3832

页数：7

共 8 条

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