共 19 条
- [2] Angus JohnC., 1986, Plasma deposited thin films: Carbon thin films, P89
- [4] ARCHER NJ, 1975, CHEM VAPOUR DEPOSITI, P556
- [6] STRUCTURAL AND COMPOSITIONAL CHARACTERIZATION OF SPUTTER-DEPOSITED WC+CO FILMS [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1978, 15 (02): : 396 - 400
- [7] FRICTION AND WEAR RESULTS FROM WC+CO COATINGS BY -DC-BIASED RF SPUTTERING IN A HELIUM ATMOSPHERE [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1978, 15 (02): : 401 - 405
- [9] SYNTHESIS OF TUNGSTEN CARBIDE FILMS BY RF MAGNETRON SPUTTERING [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 1984, 2 (03): : 1261 - 1265
- [10] HIGH-RATE REACTIVE MAGNETRON SPUTTERED TUNGSTEN CARBIDE FILMS [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 1985, 3 (06): : 2129 - 2134