STRUCTURAL AND COMPOSITIONAL CHARACTERIZATION OF SPUTTER-DEPOSITED WC+CO FILMS

被引：19

作者：

ESER, E ^{[1
]}

OGILVIE, RE ^{[1
]}

TAYLOR, KA ^{[1
]}

机构：

[1] CHARLES STARK DRAPER LAB INC,CAMBRIDGE,MA

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1978年 / 15卷 / 02期

关键词：

D O I：

10.1116/1.569556

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：396 / 400

页数：5

共 11 条

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[3] SPUTTER GAS-PRESSURE AND DC SUBSTRATE BIAS EFFECTS ON THICK RF-DIODE SPUTTERED FILMS OF TI OXYCARBIDES
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[4] CHARACTERIZATION OF ADSORBED SPECIES USING AUGER PEAK SHAPES - ETHYLENE AND CARBON-MONOXIDE ON W (100)
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[5] Chopra K.L, 1969, THIN FILM PHENOMENA
[6] POSITIVE-ION BOMBARDMENT OF SUBSTRATES IN RF DIODE GLOW-DISCHARGE SPUTTERING
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KAY, E
[J]. JOURNAL OF APPLIED PHYSICS, 1972, 43 (12) : 4965 - 4971
[7] INFLUENCE OF BIAS ON DEPOSITION OF METALLIC-FILMS IN RF AND DC SPUTTERING
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[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1974, 11 (01): : 34 - 40
[8] INFLUENCE OF SPUTTERING PARAMETERS ON COMPOSITION OF MULTICOMPONENT FILMS
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GAMBINO, RJ
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1975, 12 (01): : 79 - 83
[9] HASS TW, 1972, J APPL PHYS, V43, P1853
[10] KRAINER E, 1976, PLANSEEBER PULVERMET, V15, P46